• 专利附录
  • 专利说明
  • 权利要求
  • 类似技术
  • 同族专利
  • 引用文献
  • 法律状态
  • 优先权
    • 专利摘要:
    The apparatus comprises a plasma chamber 1 and a front and a rear preparatory vacuum chambers 8 and 9 which serve to introduce the film material F into and to lead the material out of he plasma chamber without permitting air intrusion into the plasma chamber from the atmosphere, wherein the vacuum chambers 8 and 9 are each divided into at least two (e.g. four) sealing chambers 8a-8d and 9a-9d, each being provided with a pair of opposing sealing rollers 10a-10d and 11a-11d. The low temperature plasma is generated in the plasma chamber by applying high frequency electric power to the drum-like rotatable cathode 4 and a plurality of rod-like anodes 5 surrounding the cathode and the film material F is led into the space between the cathode and the anodes in contact with the cathode to be transferred as the cathode rotates, with the aid of guide rollers 7. The electrodes and guide rollers are held on one of the side walls of the plasma chamber in cantilever fashion, the side wall being demountable and mountable upside down, and the other side wall is made a removable cover of the plasma chamber so as to facilitate film setting up and inspection or cleaning of the inside of the chamber. <IMAGE>
    公开号:SU1039438A3
    申请号:SU813306857
    申请日:1981-06-19
    公开日:1983-08-30
    发明作者:Имада Киеси；Уено Сусуму；Номура Хироказу；Кобаяси Хироаки；Хатада Кендзи；Абе Казухико；Хата Еситада；Тохкай Масай；Като Кенити
    申请人:Син-Эцу Кемикал Ко,Лтд,Хитачи Лтд (Фирма)；
    IPC主号:
    专利说明:

    This invention relates to polymer engineering, in particular, to devices of 1 m for continuous processing of a film material from plastics, for example, from a polyvinyl chloride resin, with low-temperature plasma.
    A device for the treatment of the surface of polymeric materials with a corona discharge, containing a working chamber with electrodes and inlets and outlets installed in it for the polymeric material 1
    A disadvantage of the known device is the unstable process of activating the surface of a polymeric material due to air leaking into the activation chamber.
    The closest in technical essence and the achieved result to the invention is a device for continuous processing of film material, containing a working chamber with openings on the end walls for material entry and exit, mounted on the side, the cathode in the form of a shaft mounted on the shaft a rotatable drum and a rod-shaped anode mounted parallel to the axis of the cathode, a power supply unit for the cathode and the anode, and guide rollers 2.
    The disadvantage of this device is that it is impossible to carry out plasma treatment under reduced pressure, as a result of which a number of useful properties appear in the treated polymer film, such as affinity for water, reduced accumulation of static electricity on the surface, increased printing capacity, if reduced bonding and adhesive slipane 1e surfaces, resistance to wear, etc.
    The purpose of the invention is to improve the technological capabilities of the device by treating the film material with low-temperature plasma of plasma gas under reduced pressure.
    The goal is achieved by the device for continuous processing of film material containing a working chamber with openings on the end walls for entering the material output, mounted on the side wall of the cathode as mounted on the shaft perpendicular to the direction of movement of the film with the possibility of rotation of the drum and mounted parallel to the cathode axis The return anode, the power supply unit for the cathode and the anode and the directional rollers, is provided with front and rear preparatory vacuum chambers, one connected end
    with the working chamber, and the other with the atmosphere: ferro and made of at least two sealing chambers, each of which are equipped with a pair of vertically arranged sealing rollers, a vacuum chamber of the working chamber and preparatory vacuum chambers and a node for synchronous rotation of the cathode and sealing rollers.
    In addition, the vacuum unit is made in the form of vacuum lines interconnecting vacuum pumps with a working chamber and with symmetrically disposed relative to the working chamber and pairwise connected sealing chambers of the front and rear preparatory vacuum chambers.
    The synchronous rotation assembly is made in the form of a transmission shaft for transmitting the driving force to the cathode and the sealing rollers.
    1 shows a structural diagram of the device, a side view in section; figure 2 is the same, top view; figure 3 - constructive Yhema working chamber, axial section; FIG. 4 is a diagram of a device with two working plasma chambers connected in series.
    The device contains a working plasma chamber 1 of drum-like shape with a front 2 and rear 3 openings made on the end walls of the chamber 1 for the entrance and exit of the material. Holes 2 and 3 are shaped as narrow slits with a width and height sufficient to prevent contact with moving film material. A cathode 4 is fixed on the side working chamber 1, made in the form of mounted on the shaft 5 perpendicular to the direction of the film movement with the possibility of rotating the drum. The cathode 4 is predominantly made of metal.
    Parallel to the axis of the cathode 4, a rod-shaped anode 6 is mounted, provided, if necessary, with a cooling device (not shown).
    Multiple anodes 6 are placed in working chamber 1, but sometimes a single anode 6 is sufficient to achieve the desired plasma treatment effect. Parallel placement of anodes b relative to the axis of the cathode 4 makes it possible to maintain their equal distance from the surface of the cathode 4 along its entire length, which ensures uniformity electric field, and, consequently, the uniformity of the intensity of the low-temperature plasma. Anodes b are connected to the common power terminal of a high-frequency generator (not shown), and cathode 4 is connected to the ground terminal of the generator. To feed the material into the working one, the guide rollers 7 are mounted. For vacuum sealing the chamber 1, the device is equipped with front 8 and rear 9 preparatory vacuum chambers, one end:. connected to the working chamber 1, and the other - with the atmosphere. The front and rear preparatory vacuum chambers 8 and 9 are divided by partitions 10 into at least two sealing chambers. The device (Figs. 1 and 2) includes four sealing chambers in each of the preparatory vacuum chambers 8 and 9. The sealing chambers are equipped with a pair of sealing rollers 11 and 12 vertically arranged with respect to each other. To place and rewind film of the material are the feeding and receiving reels 13 and 14 and the tension rollers 15 and 16. The working chamber 1 and the sealing chambers — in the preparatory vacuum chambers 8 and 9 — are evacuated each by a separate vacuum suction device. Phi1.2 shows the construction of a vacuum unit in the form of vacuum lines 17-20, which communicate vacuum pumps 21-24 with working chamber 1 And with symmetrically positioned relative to working chamber 1 and pairwise connected sealing chambers of the front 8 and rear 9 preparatory vacuum chambers. The synchronous rotation of the cathode 4, the sealing rollers 11 and 12, as well as the receiving reel 14 is provided by a common linear shaft 25, which can be driven by the engine 26 f by the transmission 27 for the sealing rollers 11 ri 12 in the front prepared vacuum chamber 8.28 -. Tsapodod 4 in the working chamber 1, 29 - for the uplifting yarn rollers 11 and 12. In the back of the prepared vacuum chamber 9 and 30 - for the receiving reel 14. The feeding reel1 13 and the tensioning rollers 15 and 16 are mounted with a potential free rotation. The shaft 5 (FIG. 3) is fixed on the side wall of the working chamber 1 by means of a seal 31, and the anodes are electrically insulated by an insulator 32. Pry The opposite side wall 33 is made removable with a sealing flange 34v
    The device works in the following way.
    The film material from the feeding reel 13 is captured by a pair of sealing rollers 11 and 12 in the front preparatory vacuum chamber .8 and introduced into the working plasma chamber 1, guided by a group of guide rollers 7 through the front film material passing through these chambers, is first exposed plasma atmosphere
    on one surface of it in the first working chamber, and then introduced into the second working chamber, where the plasma surface of the other film is exposed to the plasma atmosphere. Thus, the film material version 2 directly contacts the surface of the rotating cathode 4. The surface of the film material, not in contact with the surface of the cathode 4, is subjected to the action of low-temperature plasma generated in the space between the cathode 4 and the anode b, continuously as the cathode 4 rotates. The film material, guided by a group of guide rollers 7, is brought out through the rear opening 3 and the rear preparatory vacuum chamber 9-V atmosphere, also captured by a pair of sealing rollers 11 and 12, and is wound onto the take-up reel 14. The sealing chambers of the front and rear preparatory vacuum chambers of € 9 are designed so as not to allow air to enter the working chamber 1, i.e. The pressure in the end chambers is approximately equal to atmospheric pressure, and the pressure in the internal sealing chambers adjacent to the working chamber 1 is approximately equal to the pressure in the plasma working chamber 1. The smooth movement of the film material through the device is controlled by the synchronized rotation of the cathode 4 and the sealing rollers 11 and 12. It is possible that the film material produced calender-. by a syringe or syringe machine, directly coming from a jail, is introduced into the front preparatory vacuum chamber 8. In the working chamber 1, a removable cover is removed to facilitate filling of the film-like material, as well as to clean the inner surface of the working chamber 1, electrodes and guide rollers 7. In case of successive treatment by the low-temperature plasma of the upper and lower surfaces of the film material by using two working plasma chambers 1 of the same design, connected in series (Fig. 4) Enki working chambers podaerzhivayuschie respective electrodes and the guide rollers 7 are mounted on the camera body 180 from rotating relative to each. can be processed by low-temperature plasma on both surfaces during a single continuous process so that a significant increase in working efficiency is achieved. When plasma treatment is required only on one surface of the film material, it is possible to install the side walls of the working chambers in the same direction so that the film material is exposed to the plasma atmosphere on the same surface two times, which corresponds to twice the plasma action time. When the effect of plasma, which is presumably proportional to the exposure time to the plasma atmosphere, is required in a single pass, the speed of the film passing through the working chambers can be doubled. Consequently, the efficiency of plasma treatment L / can be increased by increasing only the number of plasma working chambers with a pair of front and rear preparatory vacuum chambers connected in front and behind of successively arranged working chambers. The number of working chambers may also be three or more, in accordance with the required working efficiency at an increased rate of movement of the film through the working plasma chambers. The invention allows for the high efficiency of plasma processing of a continuous film material, the variety of possibilities of a device meeting various requirements, corresponding to the material of the film to be processed and the required nature of the effects of plasma processing. 1G
     B 1
    SSJ
    srivZ
    权利要求:
    Claims (3)
    [1]
    1. DEVICE FOR CONTINUOUS PROCESSING OF FILM MATERIAL, containing a working chamber with holes on the end walls for material inlet and outlet, fixed to> the side wall of the cathode in the form of a drum-shaped anode mounted on a shaft perpendicular to the direction of movement of the film with the possibility of rotation of the drum and a rod-shaped anode parallel to the cathode axis, an electric power supply unit to the cathode and anode and guide rollers, characterized in that, in order to expand technological capabilities due to processing film material with low-temperature plasma plasma gas at reduced pressure, it is equipped with front and rear preparatory vacuum chambers, one end connected to a working chamber, and the other with an atmosphere and made of at least two sealing chambers, each of which is equipped with a pair of vertically arranged sealing rollers relative to each other, a vacuum chamber for the working chamber and preparatory vacuum chambers, and a synchronous rotation unit for the cathode and sealing rollers.
    [2]
    2. The device according to claim 1, characterized in that the evacuation unit is made in the form of vacuum lines communicating vacuum pumps with a working chamber and arranged symmetrically relative to the working chamber and pairwise connected upstream and rear preparatory vacuum chambers cameras.
    [3]
    3. The device according to claim 1, wherein the synchronous rotation unit is made in the form of a drive transmission shaft for transmitting driving force to the cathode and sealing rollers.
    //>
    类似技术:
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    同族专利:
    公开号 | 公开日
    GB2080611B|1984-06-20|
    AU7204681A|1982-01-07|
    FR2485319A1|1981-12-24|
    IT1136887B|1986-09-03|
    JPH0341496B2|1991-06-24|
    FR2485319B1|1985-01-04|
    AU547901B2|1985-11-14|
    DK270081A|1981-12-22|
    KR840000727B1|1984-05-24|
    GB2080611A|1982-02-03|
    NO155990B|1987-03-23|
    DE3124280A1|1982-05-27|
    NL8102964A|1982-01-18|
    NO155990C|1987-07-01|
    KR830006025A|1983-09-17|
    NO812087L|1981-12-22|
    IT8122492D0|1981-06-22|
    JPS5718737A|1982-01-30|
    BE889306A|1981-10-16|
    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    DE1135112B|1956-04-10|1962-08-23|Hoerder Huettenunion Ag|Glow discharge vessel with alternating current supply for high-current discharges for the treatment of bodies placed in the vessel|
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    JPS5385741A|1977-01-07|1978-07-28|Nippon Steel Corp|Continuous evaporation plating method of steel band|
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    US4511419A|1982-04-23|1985-04-16|Firma Erwin Kampf Gmbh & Co.|Method and device for laminating foils|
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    DE29600991U1|1996-01-20|1997-05-22|Straemke Siegfried Dr Ing|Plasma reactor|
    AU3892899A|1998-05-08|1999-11-29|Asten, Inc.|Structures and components thereof having a desired surface characteristic together with methods and apparatuses for producing the same|
    US6287687B1|1998-05-08|2001-09-11|Asten, Inc.|Structures and components thereof having a desired surface characteristic together with methods and apparatuses for producing the same|
    WO1999058755A1|1998-05-08|1999-11-18|Asten, Inc.|Structures and components thereof having a desired surface characteristic together with methods and apparatuses for producing the same|
    AU2003234058A1|2003-05-13|2004-12-03|Stazione Sperimentale Carta Cartoni E Paste Per Carte|Method for plasma treating paper and cardboards|
    AT504466B1|2006-10-25|2009-05-15|Eiselt Primoz|METHOD AND DEVICE FOR DEGASSING OBJECTS OR MATERIALS USING THE OXIDATIVE RADICALS|
    JP2009082796A|2007-09-28|2009-04-23|Tokyo Institute Of Technology|Plasma treatment device/method|
    法律状态:
    优先权:
    申请号 | 申请日 | 专利标题
    JP55084923A|JPH0341496B2|1980-06-21|1980-06-21|
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